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Characterisation of the Al2O3 films deposited by ultrasonic spray pyrolysis and atomic layer deposition methods for passivation of 4H-SiC devices.
Maciej
Wolborski
and Mietek
Bakowski
and Armando
Ortiz
and Viljami
Pore
and Adolf
Schöner
and Mikko
Ritala
and Markku
Leskelä
and Anders
Hallén
Microelectronics Reliability
46
743-755 (2006)
to
dblp
by
dblp
on 2007-03-27 00:00:00
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