@article{journals/mr/DuenasCGBKARL05,
	title = {Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition.},
	author = {S. Dueñas and H. Castán and H. García and J. Barbolla and K. Kukli and J. Aarik and M. Ritala and M. Leskelä},
	journal = {Microelectronics Reliability},
	number = {5-6},
	pages = {949-952},
	url = {http://dblp.uni-trier.de/db/journals/mr/mr45.html#DuenasCGBKARL05},
	volume = {45},
	year = {2005},
	biburl = {http://www.bibsonomy.org/bibtex/2736131f0e67d5183cd3731e2fa8e1f8c/dblp},
	description = {dblp},
	ee = {http://dx.doi.org/10.1016/j.microrel.2004.11.052}, date = {2007-03-27},
	keywords = {dblp }
}