%0 Journal Article %1 journals/mr/YangWKI12 %A Yang, B. L. %A Wong, Hei %A Kakushima, Kuniyuki %A Iwai, Hiroshi %D 2012 %J Microelectron. Reliab. %K dblp %N 8 %P 1613-1616 %T Improving the electrical characteristics of MOS transistors with CeO2/La2O3 stacked gate dielectric. %U http://dblp.uni-trier.de/db/journals/mr/mr52.html#YangWKI12 %V 52

@article{journals/mr/YangWKI12, added-at = {2020-02-22T00:00:00.000+0100}, author = {Yang, B. L. and Wong, Hei and Kakushima, Kuniyuki and Iwai, Hiroshi}, biburl = {https://www.bibsonomy.org/bibtex/23f2a8627e8a60de9a7ae927d5553f466/dblp}, ee = {https://doi.org/10.1016/j.microrel.2011.10.009}, interhash = {0957fa7826870dc2eff254f2d31c91ba}, intrahash = {3f2a8627e8a60de9a7ae927d5553f466}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = 8, pages = {1613-1616}, timestamp = {2020-02-25T13:29:31.000+0100}, title = {Improving the electrical characteristics of MOS transistors with CeO2/La2O3 stacked gate dielectric.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr52.html#YangWKI12}, volume = 52, year = 2012 }