%0 Conference Paper %1 conf/irps/SalivaCNHABA15 %A Saliva, M. %A Cacho, Florian %A Ndiaye, Cheikh %A Huard, Vincent %A Angot, D. %A Bravaix, Alain %A Anghel, Lorena %B IRPS %D 2015 %I IEEE %K dblp %P 4 %T Impact of gate oxide breakdown in logic gates from 28nm FDSOI CMOS technology. %U http://dblp.uni-trier.de/db/conf/irps/irps2015.html#SalivaCNHABA15 %@ 978-1-4673-7362-3

@inproceedings{conf/irps/SalivaCNHABA15, added-at = {2023-09-30T00:00:00.000+0200}, author = {Saliva, M. and Cacho, Florian and Ndiaye, Cheikh and Huard, Vincent and Angot, D. and Bravaix, Alain and Anghel, Lorena}, biburl = {https://www.bibsonomy.org/bibtex/2a4e5957b3da285b8f0bd19f954c5838c/dblp}, booktitle = {IRPS}, crossref = {conf/irps/2015}, ee = {https://doi.org/10.1109/IRPS.2015.7112782}, interhash = {96b6dd6e1bf3f64591be5acd45804525}, intrahash = {a4e5957b3da285b8f0bd19f954c5838c}, isbn = {978-1-4673-7362-3}, keywords = {dblp}, pages = 4, publisher = {IEEE}, timestamp = {2024-04-10T16:54:51.000+0200}, title = {Impact of gate oxide breakdown in logic gates from 28nm FDSOI CMOS technology.}, url = {http://dblp.uni-trier.de/db/conf/irps/irps2015.html#SalivaCNHABA15}, year = 2015 }