%0 Journal Article %1 journals/mr/TomitaKYMUTKNMI13 %A Tomita, Ryuji %A Kimura, Hidehiko %A Yasuda, M. %A Maeda, K. %A Ueno, S. %A Tomizawa, T. %A Kunimune, Y. %A Nakamura, H. %A Moritoki, M. %A Iwai, Hiroshi %D 2013 %J Microelectron. Reliab. %K dblp %N 5 %P 659-664 %T Formation of high resistivity phases of nickel silicide at small area. %U http://dblp.uni-trier.de/db/journals/mr/mr53.html#TomitaKYMUTKNMI13 %V 53

@article{journals/mr/TomitaKYMUTKNMI13, added-at = {2020-08-17T00:00:00.000+0200}, author = {Tomita, Ryuji and Kimura, Hidehiko and Yasuda, M. and Maeda, K. and Ueno, S. and Tomizawa, T. and Kunimune, Y. and Nakamura, H. and Moritoki, M. and Iwai, Hiroshi}, biburl = {https://www.bibsonomy.org/bibtex/268d5d649e6f512c69add9efb1d5ab02d/dblp}, ee = {https://doi.org/10.1016/j.microrel.2012.12.013}, interhash = {b56c7177f1ec0f14828f392acf05a94b}, intrahash = {68d5d649e6f512c69add9efb1d5ab02d}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = 5, pages = {659-664}, timestamp = {2020-08-18T11:45:08.000+0200}, title = {Formation of high resistivity phases of nickel silicide at small area.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr53.html#TomitaKYMUTKNMI13}, volume = 53, year = 2013 }