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%0 Journal Article
%1 journals/mr/FuggerPSHHDN14
%A Fugger, Michael
%A Plappert, Mathias
%A Schäffer, Carsten
%A Humbel, Oliver
%A Hutter, Herbert
%A Danninger, Herbert
%A Nowottnick, Mathias
%D 2014
%J Microelectron. Reliab.
%K dblp
%N 11
%P 2487-2493
%T Comparison of WTi and WTi(N) as diffusion barriers for Al and Cu metallization on Si with respect to thermal stability and diffusion behavior of Ti.
%U http://dblp.uni-trier.de/db/journals/mr/mr54.html#FuggerPSHHDN14
%V 54
@article{journals/mr/FuggerPSHHDN14,
added-at = {2020-02-22T00:00:00.000+0100},
author = {Fugger, Michael and Plappert, Mathias and Schäffer, Carsten and Humbel, Oliver and Hutter, Herbert and Danninger, Herbert and Nowottnick, Mathias},
biburl = {https://www.bibsonomy.org/bibtex/28fa6137397962cc88f00f9c0716d2a7f/dblp},
ee = {https://doi.org/10.1016/j.microrel.2014.04.016},
interhash = {e7210e8961a1982944c1cfeda6e638d6},
intrahash = {8fa6137397962cc88f00f9c0716d2a7f},
journal = {Microelectron. Reliab.},
keywords = {dblp},
number = 11,
pages = {2487-2493},
timestamp = {2020-02-25T13:29:47.000+0100},
title = {Comparison of WTi and WTi(N) as diffusion barriers for Al and Cu metallization on Si with respect to thermal stability and diffusion behavior of Ti.},
url = {http://dblp.uni-trier.de/db/journals/mr/mr54.html#FuggerPSHHDN14},
volume = 54,
year = 2014
}