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Silicides and local interconnections for high-performance VLSI applications.
Randy W. Mann
,
Larry A. Clevenger
,
Paul D. Agnello
, and
Francis R. White
.
IBM Journal of Research and Development
39(4):403-418
(
1995
)
@article{journals/ibmrd/MannCAW95, added-at = {2012-09-21T00:00:00.000+0200}, author = {Mann, Randy W. and Clevenger, Larry A. and Agnello, Paul D. and White, Francis R.}, biburl = {http://www.bibsonomy.org/bibtex/24bae10b4fbd77d3d014095469028ba41/dblp}, ee = {http://dx.doi.org/10.1147/rd.394.0403}, interhash = {c2e3c7a67985f151769af60286aec25d}, intrahash = {4bae10b4fbd77d3d014095469028ba41}, journal = {IBM Journal of Research and Development}, keywords = {dblp}, number = 4, pages = {403-418}, timestamp = {2012-09-21T00:00:00.000+0200}, title = {Silicides and local interconnections for high-performance VLSI applications.}, url = {http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd39.html#MannCAW95}, volume = 39, year = 1995 }
%0 Journal Article %1 journals/ibmrd/MannCAW95 %A Mann, Randy W. %A Clevenger, Larry A. %A Agnello, Paul D. %A White, Francis R. %D 1995 %J IBM Journal of Research and Development %K %N 4 %P 403-418 %T Silicides and local interconnections for high-performance VLSI applications. %U http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd39.html#MannCAW95 %V 39
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BibTeX key:
journals/ibmrd/MannCAW95
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