%0 Journal Article %1 journals/mr/KimKK14 %A Kim, Cheolgyu %A Kim, Hyeokjin %A Kang, Bongkoo %D 2014 %J Microelectron. Reliab. %K dblp %N 11 %P 2383-2387 %T Voltage dependent degradation of HfSiON/SiO2 nMOSFETs under positive bias temperature instability. %U http://dblp.uni-trier.de/db/journals/mr/mr54.html#KimKK14 %V 54

@article{journals/mr/KimKK14, added-at = {2020-02-22T00:00:00.000+0100}, author = {Kim, Cheolgyu and Kim, Hyeokjin and Kang, Bongkoo}, biburl = {https://www.bibsonomy.org/bibtex/2e20d134ca2a992e1d8359901e9007112/dblp}, ee = {https://doi.org/10.1016/j.microrel.2014.06.001}, interhash = {2ef68ac1232d17c51a9b907a23d0b196}, intrahash = {e20d134ca2a992e1d8359901e9007112}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = 11, pages = {2383-2387}, timestamp = {2020-02-25T13:30:16.000+0100}, title = {Voltage dependent degradation of HfSiON/SiO2 nMOSFETs under positive bias temperature instability.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr54.html#KimKK14}, volume = 54, year = 2014 }