%0 Journal Article %1 CastellanosGomez2011Atomically %A Castellanos-Gomez, Andres %A Wojtaszek, Magdalena %A Tombros, Nikolaos %A Agrait, Nicolas %A van Wees, Bart J. %A Rubio-Bollinger, Gabino %D 2011 %J Small %K mica %P n/a %R 10.1002/smll.201100733 %T Atomically thin mica flakes and their application as ultrathin insulating substrates for graphene %U http://dx.doi.org/10.1002/smll.201100733 %X We show that it is possible to deposit, by mechanical exfoliation on SiO2/Si wafers, atomically thin mica flakes down to a single monolayer thickness. The optical contrast of these mica flakes on top of a SiO2/Si substrate, which depends on their thickness, the illumination wavelength and the SiO2 substrate thickness, can be quantitatively accounted for by a Fresnel law based model. The preparation of atomically thin insulating crystalline sheets will enable the fabrication of ultrathin defect-free insulating substrates, dielectric barriers or planar electron tunneling junctions. Additionally, we show that few-layer graphene flakes can be deposited on top of a previously transferred mica flake. Our transfer method relies on viscoelastic stamps, as those used for soft lithography. A Raman spectroscopy study shows that such an all-dry deposition technique yields cleaner and higher quality flakes than conventional wet-transfer procedures based on lithographic resists.

@article{CastellanosGomez2011Atomically, abstract = {{We show that it is possible to deposit, by mechanical exfoliation on SiO2/Si wafers, atomically thin mica flakes down to a single monolayer thickness. The optical contrast of these mica flakes on top of a SiO2/Si substrate, which depends on their thickness, the illumination wavelength and the SiO2 substrate thickness, can be quantitatively accounted for by a Fresnel law based model. The preparation of atomically thin insulating crystalline sheets will enable the fabrication of ultrathin defect-free insulating substrates, dielectric barriers or planar electron tunneling junctions. Additionally, we show that few-layer graphene flakes can be deposited on top of a previously transferred mica flake. Our transfer method relies on viscoelastic stamps, as those used for soft lithography. A Raman spectroscopy study shows that such an all-dry deposition technique yields cleaner and higher quality flakes than conventional wet-transfer procedures based on lithographic resists.}}, added-at = {2013-09-09T23:59:35.000+0200}, archiveprefix = {arXiv}, author = {Castellanos-Gomez, Andres and Wojtaszek, Magdalena and Tombros, Nikolaos and Agrait, Nicolas and van Wees, Bart J. and Rubio-Bollinger, Gabino}, biburl = {https://www.bibsonomy.org/bibtex/23e9249f1612b19ede79606823a859612/jacksankey}, citeulike-article-id = {11628496}, citeulike-linkout-0 = {http://arxiv.org/abs/1109.2101}, citeulike-linkout-1 = {http://arxiv.org/pdf/1109.2101}, citeulike-linkout-2 = {http://dx.doi.org/10.1002/smll.201100733}, day = 9, doi = {10.1002/smll.201100733}, eprint = {1109.2101}, interhash = {96a9b99eac2fa6951bd4e4752369f8d9}, intrahash = {3e9249f1612b19ede79606823a859612}, issn = {16136810}, journal = {Small}, keywords = {mica}, month = sep, pages = {n/a}, posted-at = {2012-11-07 15:31:48}, priority = {2}, timestamp = {2013-09-09T23:59:35.000+0200}, title = {{Atomically thin mica flakes and their application as ultrathin insulating substrates for graphene}}, url = {http://dx.doi.org/10.1002/smll.201100733}, year = 2011 }