( en | de | ru )

 

Disambiguation of "Park, Jong-Tae"

Author of the publication

copydeleteadd this publication to your clipboard
Design and implementation of an interoperable messaging system for IoT healthcare services.

, , , and . CCNC, page 45-52. IEEE, (2017)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

Tae-jong Yang

Jong-Mi Park

Hyun-Jong Park

Tae Seok Park

Tae-Sik Park

 

Other publications of authors with the same name

Semantic Query Processing in Object-Oriented Database Systems., and . DASFAA, volume 2 of Advanced Database Research and Development Series, page 11-20. World Scientific, (1991)Managing the New Telecommunications Paradigms: A Report on APNOMS'98., , , and . J. Netw. Syst. Manag., 6 (4): 497-500 (1998)CoAP-Based Mobility Management for the Internet of Things., , and . Sensors, 15 (7): 16060-16082 (2015)Fast Mobility Management for Delay-Sensitive Applications Using Multiple Tunnels in Vehicular Networks., and . IEICE Trans. Commun., 95-B (5): 1689-1701 (2012)Localization of Wi-Fi Access Point Using Smart Phone's GPS Information., , , and . IEICE Trans. Commun., 96-B (1): 305-308 (2013)Wire width dependence of hot carrier degradation in silicon nanowire gate-all-around MOSFETs., and . Microelectron. Reliab., 55 (9-10): 1438-1441 (2015)The optimum fin width in p-MuGFETs with the consideration of NBTI and hot carrier degradation., , and . Microelectron. Reliab., 50 (9-11): 1316-1319 (2010)NBTI and hot-carrier effects in accumulation-mode Pi-gate pMOSFETs., , , , , , , and . Microelectron. Reliab., 49 (9-11): 1044-1047 (2009)Device instability of amorphous InGaZnO thin film transistors with transparent source and drain., , , and . Microelectron. Reliab., (2016)Reliability improvement by the suppression of keyhole generation in W-plug vias., , , and . Microelectron. Reliab., 45 (9-11): 1455-1458 (2005)