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Reliability studies of a 10nm high-performance and low-power CMOS technology featuring 3rd generation FinFET and 5th generation HK/MG., , , , and . IRPS, page 6. IEEE, (2018)A detailed comparison of various off-state breakdown methodologies for scaled Tri-gate technologies., , , , , , , and . IRPS, page 1-6. IEEE, (2023)Transistor reliability variation correlation to threshold voltage., , , , , and . IRPS, page 3. IEEE, (2015)A Reliability Overview of Intel's 10+ Logic Technology., , , , , , , , , and 25 other author(s). IRPS, page 1-6. IEEE, (2020)Transistor aging and reliability in 14nm tri-gate technology., , , , , , , , , and . IRPS, page 2. IEEE, (2015)A Unified Aging Model Framework Capturing Device to Circuit Degradation for Advance Technology Nodes., , , , , , and . IRPS, page 1-4. IEEE, (2023)Reliability Studies on Advanced FinFET Transistors of the Intel 4 CMOS Technology., , , , , , and . IRPS, page 1-5. IEEE, (2023)Method to evaluate off-state breakdown in scaled Tri-gate technologies., , , , , and . IRPS, page 1-6. IEEE, (2022)Reliability Stressing Control Using Jacobian Feedback Kelvin Measurement on Intel Technologies., , , , , and . IRPS, page 1-4. IEEE, (2020)Reliability Characterization for 12 V Application Using the 22FFL FinFET Technology., , , , , , , , , and 5 other author(s). IRPS, page 1-5. IEEE, (2020)