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• Yield enhancement in photolithography through model-based process control: average mode control
  Benyamin Grosman and Sivan Lachman-Shalem and Raaya Swissa and D. R. Lewin IEEE Transactions on Semiconductor Manufacturing18(1):86--93February2005.
  to simulated model control, yield optimal inputs, mode semiconductor PROLITH feedback structure, regulatory programming, facility electron algorithms, microscopy, multivariable control parameters, scanning predictive fabrication manufacture, photolithography, implementation, modelling package, enhancement process stepper controller, integrated genetic values, strategy, KLA-Tencor-FINLE circuit setpoint systems, empirical models, based average nonlinear by brazovayeye on Jun 19, 2008, 5:35 PM
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