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%0 Journal Article
%1 Zhang2005
%A Zhang, W. J.
%A Chan, C. Y.
%A Meng, X. M.
%A Fung, M. K.
%A Bello, I.
%A Lifshitz, Y.
%A Lee, S. T.
%A Jiang, X.
%D 2005
%J Angewandte Chemie International Edition
%K chemical chemistry crystal deposition growth mechanisms nitrides plasma reaction vapor
%N 30
%P 4749--4753
%R 10.1002/anie.200500320
%T The Mechanism of Chemical Vapor Deposition of Cubic Boron Nitride
Films from Fluorine-Containing Species
%V 44
@article{Zhang2005,
added-at = {2009-11-05T12:01:24.000+0100},
author = {Zhang, W. J. and Chan, C. Y. and Meng, X. M. and Fung, M. K. and Bello, I. and Lifshitz, Y. and Lee, S. T. and Jiang, X.},
biburl = {https://www.bibsonomy.org/bibtex/2140a301ace9ec0fd8516405830c22c00/ghuot},
doi = {10.1002/anie.200500320},
interhash = {00dd8b68869d58e05718903f9a4ae11f},
intrahash = {140a301ace9ec0fd8516405830c22c00},
journal = {Angewandte Chemie International Edition},
keywords = {chemical chemistry crystal deposition growth mechanisms nitrides plasma reaction vapor},
number = 30,
owner = {Guillaume},
pages = {4749--4753},
timestamp = {2009-11-05T12:01:36.000+0100},
title = {The Mechanism of Chemical Vapor Deposition of Cubic Boron Nitride
Films from Fluorine-Containing Species},
volume = 44,
year = 2005
}