%0 Journal Article %1 journals/mr/YeCWWZ18 %A Ye, Xuerong %A Chen, Cen %A Wang, Yixing %A Wang, L. %A Zhai, Guofu %D 2018 %J Microelectron. Reliab. %K dblp %P 37-41 %T VDMOSFET HEF degradation modelling considering turn-around phenomenon. %U http://dblp.uni-trier.de/db/journals/mr/mr80.html#YeCWWZ18 %V 80

@article{journals/mr/YeCWWZ18, added-at = {2020-02-22T00:00:00.000+0100}, author = {Ye, Xuerong and Chen, Cen and Wang, Yixing and Wang, L. and Zhai, Guofu}, biburl = {https://www.bibsonomy.org/bibtex/2f9cded1cbf0f094d9ced7aba0d7f3402/dblp}, ee = {https://doi.org/10.1016/j.microrel.2017.11.015}, interhash = {8e2aea1628ba87f92d63564c9fda3837}, intrahash = {f9cded1cbf0f094d9ced7aba0d7f3402}, journal = {Microelectron. Reliab.}, keywords = {dblp}, pages = {37-41}, timestamp = {2020-02-25T13:26:32.000+0100}, title = {VDMOSFET HEF degradation modelling considering turn-around phenomenon.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr80.html#YeCWWZ18}, volume = 80, year = 2018 }