%0 Journal Article %1 D4NA00821A %A Odobesko, Artem %A Jung, Johannes %A Szczerbakow, Andrzej %A Korczak, Jędrzej %A Story, Tomasz %A Bode, Matthias %D 2025 %I RSC %J Nanoscale Adv. %K a %N 7 %P 1885-1891 %R 10.1039/D4NA00821A %T Reversible doping and fine-tuning of the Dirac point position in the topological crystalline insulator Pb$_1−x$Sn$_x$Se via sputtering and annealing process %U http://dx.doi.org/10.1039/D4NA00821A %V 7 %X In this study, we utilize scanning tunneling microscopy and spectroscopy to detail a sputter- and annealing methodology for preparing atomically clean Pb1−xSnxSe(001) surfaces. We examine the impact these processes have on the surface quality, the composition, and the electronic properties. Our findings demonstrate that annealing temperatures between 250 °C and 280 °C produce smooth surfaces while maintaining the topological properties of Pb1−xSnxSe. Fine control of the annealing temperature also allows for a reversible tuning of the doping level, enabling a positive or negative shift of the Dirac point energy with respect to the Fermi level. Our results highlight the effectiveness of these cleaning methods and demonstrate their potential for future research and applications in topological crystalline insulator materials.

@article{D4NA00821A, abstract = {In this study{,} we utilize scanning tunneling microscopy and spectroscopy to detail a sputter- and annealing methodology for preparing atomically clean Pb1−xSnxSe(001) surfaces. We examine the impact these processes have on the surface quality{,} the composition{,} and the electronic properties. Our findings demonstrate that annealing temperatures between 250 °C and 280 °C produce smooth surfaces while maintaining the topological properties of Pb1−xSnxSe. Fine control of the annealing temperature also allows for a reversible tuning of the doping level{,} enabling a positive or negative shift of the Dirac point energy with respect to the Fermi level. Our results highlight the effectiveness of these cleaning methods and demonstrate their potential for future research and applications in topological crystalline insulator materials.}, added-at = {2025-04-17T16:45:25.000+0200}, author = {Odobesko, Artem and Jung, Johannes and Szczerbakow, Andrzej and Korczak, Jędrzej and Story, Tomasz and Bode, Matthias}, biburl = {https://www.bibsonomy.org/bibtex/22f14d66b61bddd94cf95d9df2e3e49b9/ctqmat}, day = 10, description = {Reversible doping and fine-tuning of the Dirac point position in the topological crystalline insulator Pb1−xSnxSe via sputtering and annealing process - Nanoscale Advances (RSC Publishing)}, doi = {10.1039/D4NA00821A}, interhash = {f7534edc539cb5785d1efd2c7353b0ba}, intrahash = {2f14d66b61bddd94cf95d9df2e3e49b9}, journal = {Nanoscale Adv.}, keywords = {a}, month = {02}, number = 7, pages = {1885-1891}, publisher = {RSC}, timestamp = {2025-04-17T16:45:25.000+0200}, title = {Reversible doping and fine-tuning of the Dirac point position in the topological crystalline insulator Pb$_{\mathbf{1−x}}$Sn$_{\mathbf{x}}$Se via sputtering and annealing process}, url = {http://dx.doi.org/10.1039/D4NA00821A}, volume = 7, year = 2025 }