( en | de | ru )

 

Disambiguation of "Grosman, Benyamin"

Author of the publication

copydeleteadd this publication to your clipboard
Yield enhancement in photolithography through model-based process control: average mode control

, , , and . IEEE Transactions on Semiconductor Manufacturing, 18 (1): 86--93 (February 2005)
DOI: 10.1109/TSM.2004.836654

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

Wilhelm Grosman

Benyamin Axelrad

Benyamin Barslai

Serguei Grosman

 

Other publications of authors with the same name

Automated nonlinear model predictive control using genetic programming, and . Computers & Chemical Engineering, 26 (4-5): 631--640 (2002)Industry engagement with control research: Perspective and messages., , , , , , , , , and 5 other author(s). Annu. Rev. Control., (2020)The role of process system engineering (PSE) in integrated circuit (IC) manufacturing, , and . Control Engineering Practice, 15 (7): 793--802 (July 2006)Special Issue on Award Winning Applications, 2005 IFAC World Congress.Lyapunov-based stability analysis automated by genetic programming., and . Autom., 45 (1): 252-256 (2009)Fast-acting insulin aspart (Fiasp®) improves glycemic outcomes when used with MiniMedTM 670G hybrid closed-loop system in simulated trials compared to NovoLog®., , , , , , , , , and . Comput. Methods Programs Biomed., (2021)Modeling and temperature control of rapid thermal processing., , and . Comput. Chem. Eng., 30 (4): 686-697 (2006)Adaptive genetic programming for steady-state process modeling., and . Comput. Chem. Eng., 28 (12): 2779-2790 (2004)Yield enhancement in photolithography through model-based process control: average mode control, , , and . IEEE Transactions on Semiconductor Manufacturing, 18 (1): 86--93 (February 2005)