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Yield enhancement in photolithography through model-based process control: average mode control

, , , and . IEEE Transactions on Semiconductor Manufacturing, 18 (1): 86--93 (February 2005)
DOI: 10.1109/TSM.2004.836654

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Yield enhancement in photolithography through model-based process control: average mode control, , , and . IEEE Transactions on Semiconductor Manufacturing, 18 (1): 86--93 (February 2005)The role of process system engineering (PSE) in integrated circuit (IC) manufacturing, , and . Control Engineering Practice, 15 (7): 793--802 (July 2006)Special Issue on Award Winning Applications, 2005 IFAC World Congress.