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Mendeley-A Last. fm For Research?

, and . eScience, 2008. eScience'08. IEEE Fourth International Conference on, page 327–328. (2009)

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On the Effect of Cationic Surfactants in the Rinse to Reduce Pattern Collapse in High Aspect Ratio Patterning of Photoresists., , , , , , , , , and 1 other author(s). ICMENS, page 14-15. IEEE Computer Society, (2005)Mendeley-A Last. fm For Research?, and . eScience, 2008. eScience'08. IEEE Fourth International Conference on, page 327–328. (2009)