Article,

Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting

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Nano Letters, 7 (2): 233--237 (2007)PMID: 17243748.
DOI: 10.1021/nl061217f

Abstract

Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.

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