Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach.
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%0 Conference Paper
%1 conf/vlsit/KunduDSSBGCDBLB23
%A Kundu, Shreya
%A van Doip, D. H.
%A Schram, Tom
%A Smets, Quentin
%A Banerjee, S.
%A Groven, Benjamin
%A Cott, Daire
%A Decoster, S.
%A Bezard, P.
%A Lazzarino, F.
%A Banerjee, K.
%A Ghosh, Souvik
%A de Mamelfe, J. F.
%A Morin, Pierre
%A de la Rosa, Cesar J. Lockhart
%A Asselberghs, Inge
%A Kar, Gouri Sankar
%B VLSI Technology and Circuits
%D 2023
%I IEEE
%K dblp
%P 1-2
%T Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach.
%U http://dblp.uni-trier.de/db/conf/vlsit/vlsit2023.html#KunduDSSBGCDBLB23
%@ 978-4-86348-806-9
@inproceedings{conf/vlsit/KunduDSSBGCDBLB23,
added-at = {2024-05-29T00:00:00.000+0200},
author = {Kundu, Shreya and van Doip, D. H. and Schram, Tom and Smets, Quentin and Banerjee, S. and Groven, Benjamin and Cott, Daire and Decoster, S. and Bezard, P. and Lazzarino, F. and Banerjee, K. and Ghosh, Souvik and de Mamelfe, J. F. and Morin, Pierre and de la Rosa, Cesar J. Lockhart and Asselberghs, Inge and Kar, Gouri Sankar},
biburl = {https://www.bibsonomy.org/bibtex/251653acb8d1f4da2fdaa2767a24eecc1/dblp},
booktitle = {VLSI Technology and Circuits},
crossref = {conf/vlsit/2023},
ee = {https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185413},
interhash = {0e0845e486984642bab64405c5990bbd},
intrahash = {51653acb8d1f4da2fdaa2767a24eecc1},
isbn = {978-4-86348-806-9},
keywords = {dblp},
pages = {1-2},
publisher = {IEEE},
timestamp = {2024-06-03T07:22:13.000+0200},
title = {Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach.},
url = {http://dblp.uni-trier.de/db/conf/vlsit/vlsit2023.html#KunduDSSBGCDBLB23},
year = 2023
}