Abstract
Fabrication of graphene nanostructures it is important for both
investigating their intrinsic physical properties and applying them into
various functional devices. In this work we present a study on atomic
layer deposition (ALD) of Al2O3 to produce patterned graphene through
area-selective chemical vapor deposition (CVD) growth. A systematic
parametric study was conducted to determine how the number of cycles and
the purging time affect the morphology and the electrical properties of
both graphene and Al2O3 layers.
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