Inproceedings,
On linewidth-based yield analysis for nanometer lithography.
A. Sreedhar, and S. Kundu.DATE, page 381-386. IEEE, (2009)
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- conf/date/SreedharK09
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- DATE
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- 2009
- pages
- 381-386
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- IEEE
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- conf/date/2009
- ee
- http://dl.acm.org/citation.cfm?id=1874712
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- 978-1-4244-3781-8
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- http://dblp.uni-trier.de/db/conf/date/date2009.html#SreedharK09
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- please select -%0 Conference Paper
%1 conf/date/SreedharK09
%A Sreedhar, Aswin
%A Kundu, Sandip
%B DATE
%D 2009
%E Benini, Luca
%E Micheli, Giovanni De
%E Al-Hashimi, Bashir M.
%E Müller, Wolfgang
%I IEEE
%K dblp
%P 381-386
%T On linewidth-based yield analysis for nanometer lithography.
%U http://dblp.uni-trier.de/db/conf/date/date2009.html#SreedharK09
%@ 978-1-4244-3781-8
@inproceedings{conf/date/SreedharK09,
added-at = {2017-05-23T00:00:00.000+0200},
author = {Sreedhar, Aswin and Kundu, Sandip},
biburl = {https://www.bibsonomy.org/bibtex/2d2ef04b981fe597df04722722a67a4ef/dblp},
booktitle = {DATE},
crossref = {conf/date/2009},
editor = {Benini, Luca and Micheli, Giovanni De and Al-Hashimi, Bashir M. and Müller, Wolfgang},
ee = {http://dl.acm.org/citation.cfm?id=1874712},
interhash = {40284eaa36ea7f7735959bcd60381e1b},
intrahash = {d2ef04b981fe597df04722722a67a4ef},
isbn = {978-1-4244-3781-8},
keywords = {dblp},
pages = {381-386},
publisher = {IEEE},
timestamp = {2019-10-17T15:02:11.000+0200},
title = {On linewidth-based yield analysis for nanometer lithography.},
url = {http://dblp.uni-trier.de/db/conf/date/date2009.html#SreedharK09},
year = 2009
}