%0 Journal Article %1 journals/jei/AubretonBVLGC04 %A Aubreton, Olivier %A Bellach, Benaissa %A Voon, Lew Fock Chong Lew Yan %A Lamalle, Bernard %A Gorria, Patrick %A Cathébras, Guy %D 2004 %J J. Electronic Imaging %K dblp %N 3 %P 559-569 %T Retina for pattern matching in standard 0.6-µm complementary metal oxide semiconductor technology. %U http://dblp.uni-trier.de/db/journals/jei/jei13.html#AubretonBVLGC04 %V 13

@article{journals/jei/AubretonBVLGC04, added-at = {2021-10-14T00:00:00.000+0200}, author = {Aubreton, Olivier and Bellach, Benaissa and Voon, Lew Fock Chong Lew Yan and Lamalle, Bernard and Gorria, Patrick and Cathébras, Guy}, biburl = {https://www.bibsonomy.org/bibtex/2ee6055166f25d0d8e22e354a06e51b06/dblp}, ee = {https://doi.org/10.1117/1.1762886}, interhash = {6b88df35df44b0bd5be27b0a9496618e}, intrahash = {ee6055166f25d0d8e22e354a06e51b06}, journal = {J. Electronic Imaging}, keywords = {dblp}, number = 3, pages = {559-569}, timestamp = {2024-04-08T12:02:30.000+0200}, title = {Retina for pattern matching in standard 0.6-µm complementary metal oxide semiconductor technology.}, url = {http://dblp.uni-trier.de/db/journals/jei/jei13.html#AubretonBVLGC04}, volume = 13, year = 2004 }