%0 Conference Paper %1 conf/essderc/MartWCRZK18 %A Mart, Clemens %A Weinreich, Wenke %A Czernohorsky, Malte %A Riedel, Stefan %A Zybell, S. %A Kuhnel, Kü %B ESSDERC %D 2018 %I IEEE %K dblp %P 130-133 %T CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures. %U http://dblp.uni-trier.de/db/conf/essderc/essderc2018.html#MartWCRZK18 %@ 978-1-5386-5401-9

@inproceedings{conf/essderc/MartWCRZK18, added-at = {2021-04-20T00:00:00.000+0200}, author = {Mart, Clemens and Weinreich, Wenke and Czernohorsky, Malte and Riedel, Stefan and Zybell, S. and Kuhnel, Kü}, biburl = {https://www.bibsonomy.org/bibtex/286e5d6177526aefd16a535e9b8f7dce0/dblp}, booktitle = {ESSDERC}, crossref = {conf/essderc/2018}, ee = {https://doi.org/10.1109/ESSDERC.2018.8486864}, interhash = {80fed1066558767f6a7f2dcf6ffb474c}, intrahash = {86e5d6177526aefd16a535e9b8f7dce0}, isbn = {978-1-5386-5401-9}, keywords = {dblp}, pages = {130-133}, publisher = {IEEE}, timestamp = {2024-04-10T10:01:29.000+0200}, title = {CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures.}, url = {http://dblp.uni-trier.de/db/conf/essderc/essderc2018.html#MartWCRZK18}, year = 2018 }