%0 Journal Article %1 journals/mj/YaoXZTL23 %A Yao, Wenze %A Xu, Hongcheng %A Zhao, Haojie %A Tao, Ming %A Liu, Jie %D 2023 %J Microelectron. J. %K dblp %P 105718 %T Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography. %U http://dblp.uni-trier.de/db/journals/mj/mj133.html#YaoXZTL23 %V 133

@article{journals/mj/YaoXZTL23, added-at = {2023-05-01T00:00:00.000+0200}, author = {Yao, Wenze and Xu, Hongcheng and Zhao, Haojie and Tao, Ming and Liu, Jie}, biburl = {https://www.bibsonomy.org/bibtex/245af6240f06e2c8752cf3b422f69086d/dblp}, ee = {https://doi.org/10.1016/j.mejo.2023.105718}, interhash = {8adda2b0201648597d73dd26af1e5cec}, intrahash = {45af6240f06e2c8752cf3b422f69086d}, journal = {Microelectron. J.}, keywords = {dblp}, month = {March}, pages = 105718, timestamp = {2024-04-08T21:36:40.000+0200}, title = {Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography.}, url = {http://dblp.uni-trier.de/db/journals/mj/mj133.html#YaoXZTL23}, volume = 133, year = 2023 }