%0 Conference Paper %1 conf/amcc/RouquetteACT02 %A Rouquette, Sébastien %A Autrique, Laurent %A Chaussavoine, Charles %A Thomas, Laurent %B ACC %D 2002 %I IEEE %K dblp %P 3813-3816 %T 3D thermal modeling of a plasma assisted chemical vapor deposition process. %U http://dblp.uni-trier.de/db/conf/amcc/acc2002.html#RouquetteACT02 %@ 0-7803-7298-0

@inproceedings{conf/amcc/RouquetteACT02, added-at = {2024-08-03T00:00:00.000+0200}, author = {Rouquette, Sébastien and Autrique, Laurent and Chaussavoine, Charles and Thomas, Laurent}, biburl = {https://www.bibsonomy.org/bibtex/29d094d0e3fa5a2dba6d4b8082254f316/dblp}, booktitle = {ACC}, crossref = {conf/amcc/2002}, ee = {https://doi.org/10.1109/ACC.2002.1024522}, interhash = {baafd173124d76eebc19eab8757b80a7}, intrahash = {9d094d0e3fa5a2dba6d4b8082254f316}, isbn = {0-7803-7298-0}, keywords = {dblp}, pages = {3813-3816}, publisher = {IEEE}, timestamp = {2024-08-05T07:46:14.000+0200}, title = {3D thermal modeling of a plasma assisted chemical vapor deposition process.}, url = {http://dblp.uni-trier.de/db/conf/amcc/acc2002.html#RouquetteACT02}, year = 2002 }