Article,

Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb

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Phys. Rev. Mater., 4 (11): 114402 (Nov 2, 2020)
DOI: 10.1103/PhysRevMaterials.4.114402

Abstract

We report the growth of CuMnSb thin films by molecular beam epitaxy on InAs (001) substrates. The CuMnSb layers are compressively strained (0.6 %) due to lattice mismatch. The thin films have a ω full width at half-maximum of 7.7 arcsec according to high resolution x-ray diffraction, and a root-mean-square roughness of 0.14 nm as determined by atomic force microscopy. Magnetic and electrical properties are found to be consistent with reported values from bulk samples. We find a Néel temperature of 62 K, a Curie-Weiss temperature of −65 K, and an effective moment of 5.9μB/f.u. Transport measurements confirm the antiferromagnetic transition and show a residual resistivity at 4 K of 35μΩ cm.

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