%0 Journal Article %1 kloxin2011mechanophotopatterning %A Kloxin, Christopher J. %A Scott, Timothy F. %A Park, Hee Young %A Bowman, Christopher N. %D 2011 %I WILEY-VCH Verlag %J Advanced Materials %K mechanopatterning nextgen thiolene topography %N 17 %P 1977--1981 %R 10.1002/adma.201100323 %T Mechanophotopatterning on a Photoresponsive Elastomer %U http://dx.doi.org/10.1002/adma.201100323 %V 23

@article{kloxin2011mechanophotopatterning, added-at = {2016-12-01T17:04:48.000+0100}, author = {Kloxin, Christopher J. and Scott, Timothy F. and Park, Hee Young and Bowman, Christopher N.}, biburl = {https://www.bibsonomy.org/bibtex/2293838ff222d6379cc0677f09f5f823c/bkoch}, description = {Mechanophotopatterning on a Photoresponsive Elastomer - Kloxin - 2011 - Advanced Materials - Wiley Online Library}, doi = {10.1002/adma.201100323}, interhash = {0a5bcfda9f9021f528f92e2e826e88b5}, intrahash = {293838ff222d6379cc0677f09f5f823c}, issn = {1521-4095}, journal = {Advanced Materials}, keywords = {mechanopatterning nextgen thiolene topography}, number = 17, pages = {1977--1981}, publisher = {WILEY-VCH Verlag}, timestamp = {2016-12-01T17:04:48.000+0100}, title = {Mechanophotopatterning on a Photoresponsive Elastomer}, url = {http://dx.doi.org/10.1002/adma.201100323}, volume = 23, year = 2011 }