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Electron emission from nanocrystalline boron nitride films synthesized by plasma-assisted chemical vapor deposition

, , , and . Diamond and Related Materials, 7 (2-5): 632--635 (1998)

Abstract

Boron nitride (BN) films were synthesized using BCl3 and N2 as source gases by plasma-assisted chemical vapor deposition (PACVD). The BN film consists of hexagonal grains of 3 nm in size. The energy gap is estimated to be as wide as 6.0 eV from ultraviolet-visible optical transmission measurement. The electrical resistivity is estimated to be 2 ? 1011 and 1.3 ? 102 Ømega cm for undoped and sulfur-doped BN films, respectively. The electron emission current is detected at electric fields higher than 9 V/m. The tunneling barrier height is estimated to be 0.1 eV from the Fowler-Nordheim (FN) plot. It is demonstrated that the electron emission characteristic of Si tip array is much improved by coating with BN film.

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