Boron nitride (BN) films were synthesized using BCl3 and N2 as source
gases by plasma-assisted chemical vapor deposition (PACVD). The BN
film consists of hexagonal grains of 3 nm in size. The energy gap
is estimated to be as wide as 6.0 eV from ultraviolet-visible optical
transmission measurement. The electrical resistivity is estimated
to be 2 ? 1011 and 1.3 ? 102 Ømega cm for undoped and sulfur-doped
BN films, respectively. The electron emission current is detected
at electric fields higher than 9 V/m. The tunneling barrier height
is estimated to be 0.1 eV from the Fowler-Nordheim (FN) plot. It
is demonstrated that the electron emission characteristic of Si tip
array is much improved by coating with BN film.
%0 Journal Article
%1 Sugino98
%A Sugino, T.
%A Tanioka, K.
%A Kawasaki, S.
%A Shirafuji, J.
%D 1998
%J Diamond and Related Materials
%K imported
%N 2-5
%P 632--635
%T Electron emission from nanocrystalline boron nitride films synthesized
by plasma-assisted chemical vapor deposition
%V 7
%X Boron nitride (BN) films were synthesized using BCl3 and N2 as source
gases by plasma-assisted chemical vapor deposition (PACVD). The BN
film consists of hexagonal grains of 3 nm in size. The energy gap
is estimated to be as wide as 6.0 eV from ultraviolet-visible optical
transmission measurement. The electrical resistivity is estimated
to be 2 ? 1011 and 1.3 ? 102 Ømega cm for undoped and sulfur-doped
BN films, respectively. The electron emission current is detected
at electric fields higher than 9 V/m. The tunneling barrier height
is estimated to be 0.1 eV from the Fowler-Nordheim (FN) plot. It
is demonstrated that the electron emission characteristic of Si tip
array is much improved by coating with BN film.
@article{Sugino98,
abstract = {Boron nitride (BN) films were synthesized using BCl3 and N2 as source
gases by plasma-assisted chemical vapor deposition (PACVD). The BN
film consists of hexagonal grains of 3 nm in size. The energy gap
is estimated to be as wide as 6.0 eV from ultraviolet-visible optical
transmission measurement. The electrical resistivity is estimated
to be 2 ? 1011 and 1.3 ? 102 \Omega cm for undoped and sulfur-doped
BN films, respectively. The electron emission current is detected
at electric fields higher than 9 V/\mu m. The tunneling barrier height
is estimated to be 0.1 eV from the Fowler-Nordheim (FN) plot. It
is demonstrated that the electron emission characteristic of Si tip
array is much improved by coating with BN film.},
added-at = {2009-11-05T12:01:24.000+0100},
author = {Sugino, T. and Tanioka, K. and Kawasaki, S. and Shirafuji, J.},
biburl = {https://www.bibsonomy.org/bibtex/264846bac6405ea658076a59c8c83d981/ghuot},
interhash = {d491b669fd33cabe193274cffa57e322},
intrahash = {64846bac6405ea658076a59c8c83d981},
journal = {Diamond and Related Materials},
keywords = {imported},
number = {2-5},
owner = {Guillaume},
pages = {632--635},
timestamp = {2009-11-05T12:01:35.000+0100},
title = {Electron emission from nanocrystalline boron nitride films synthesized
by plasma-assisted chemical vapor deposition},
volume = 7,
year = 1998
}