Abstract
High quality cubic boron nitride films were deposited at temperature
as low as 870 ?C by r.f. bias assisted plasma jet chemical vapor
deposition. The decrease of growth temperature is achieved by the
application of r.f. bias instead of d.c. bias. Raman peaks were observed
for the samples deposited at 1120 to 870 ?C. The growth rate is approximately
0.3 m/min and change not much with changing growth temperature.
At 1120 ?C nearly phase pure cubic boron nitride phase was obtained.
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