%0 Generic %1 Taylor1991 %A Taylor, R. L. %A A.Pickering, M. %A Keeley, J. T. %D 1991 %K imported %N 4997678 %T Chemical vapor deposition process to replicate the finish and figure of preshaped structures %U http://www.freepatentsonline.com/4997678.html %X A process is disclosed by which the finish and figure of polished preshaped structures (such as mirrors) can be replicated directly by chemical vapor deposition, with only minor polishing of the replica being required to obtain a final product, and with the original substrate being reusable for further replication. Relevant conditions under which the process can be carried out are given. Featured in the process is a pretreatment step prior to the deposition of a layer of silicon carbide to form the replica, which pretreatment step involves the formation on the polished substrate of an oxide layer and a carbon layer of high finish and uniform thickness. The carbon layer allows easy separation of the substrate and replica which otherwise would be bound together.

@patent{Taylor1991, abstract = { A process is disclosed by which the finish and figure of polished preshaped structures (such as mirrors) can be replicated directly by chemical vapor deposition, with only minor polishing of the replica being required to obtain a final product, and with the original substrate being reusable for further replication. Relevant conditions under which the process can be carried out are given. Featured in the process is a pretreatment step prior to the deposition of a layer of silicon carbide to form the replica, which pretreatment step involves the formation on the polished substrate of an oxide layer and a carbon layer of high finish and uniform thickness. The carbon layer allows easy separation of the substrate and replica which otherwise would be bound together.}, added-at = {2009-11-05T12:01:24.000+0100}, author = {Taylor, R. L. and A.Pickering, M. and Keeley, J. T.}, bibtexkey = {Taylor1991}, biburl = {https://www.bibsonomy.org/bibtex/2a2b54f796ea7b006ce0a03eac3459833/ghuot}, file = {Taylor1991.pdf:SiC\\Taylor1991.pdf:PDF}, interhash = {329dee244caf83e5991062d2ead17f9d}, intrahash = {a2b54f796ea7b006ce0a03eac3459833}, keywords = {imported}, number = 4997678, organization = {CVD INC (US) }, owner = {Guillaume}, timestamp = {2009-11-05T12:01:35.000+0100}, title = {Chemical vapor deposition process to replicate the finish and figure of preshaped structures }, type = { United States Patent}, url = {http://www.freepatentsonline.com/4997678.html}, year = 1991 }