Article,

We analyzed possibility to increase density of elements of integrated circuits. We illustrate the possibility by example of manufacturing of a circuit XOR. Framework the paper we consider a heterostructure which includes into itself a substrate and an epitaxial layer with specific configuration. Several required areas of the heterostructure have been doped by diffusion and/or ion implantation. After that we consider optimized annealing of dopant and/or radiation defects

.
International Journal of Recent advances in Physics (IJRAP), 5 (1): 1-18 (02/2016 2016)

Abstract

We analyzed possibility to increase density of elements of integrated circuits. We illustrate the possibility by example of manufacturing of a circuit XOR. Framework the paper we consider a heterostructure which includes into itself a substrate and an epitaxial layer with specific configuration. Several required areas of the heterostructure have been doped by diffusion and/or ion implantation. After that we consider optimized annealing of dopant and/or radiation defects.

Tags

Users

  • @johnkenadi1985.

Comments and Reviews