%0 Journal Article %1 Bello05a %A Bello, I. %A Chan, C.Y. %A Zhang, W.J. %A Chong, Y.M. %A Leung, K.M. %A Lee, S.T. %A Lifshitz, Y. %D 2005 %J Diamond and Related Materials %K CVD Cubic Epitaxy; Physical Plasma boron deposition; enhanced nitride; vapor %N 3-7 %P 1154-1162 %R doi:10.1016/j.diamond.2004.12.041 %T Deposition of thick cubic boron nitride films: The route to practical applications %V 14 %X Physical and chemical vapor deposition approaches of growing thick cubic boron nitride (cBN) films needed for practical applications are reviewed. The interfacial soft hexagonal/amorphous boron nitride (hBN/aBN) layers and large stress associated with cBN deposition are suppressed through: (1) reduction of ion energy, (2) deposition at elevated temperatures, (3) post-deposition treatment, (4) use of buffer layers and (5) introduction of halogen chemistry. The most striking recent application of fluorine chemistry on diamond interlayers in our laboratory yielded thick, epitaxial cBN films with well-resolved Raman cBN spectra. This opens the road for growing adherent and thick large area poly- and single crystalline cBN with no soft interlayer and the quality sufficient for mechanical and electronic applications.

@article{Bello05a, abstract = {Physical and chemical vapor deposition approaches of growing thick cubic boron nitride (cBN) films needed for practical applications are reviewed. The interfacial soft hexagonal/amorphous boron nitride (hBN/aBN) layers and large stress associated with cBN deposition are suppressed through: (1) reduction of ion energy, (2) deposition at elevated temperatures, (3) post-deposition treatment, (4) use of buffer layers and (5) introduction of halogen chemistry. The most striking recent application of fluorine chemistry on diamond interlayers in our laboratory yielded thick, epitaxial cBN films with well-resolved Raman cBN spectra. This opens the road for growing adherent and thick large area poly- and single crystalline cBN with no soft interlayer and the quality sufficient for mechanical and electronic applications.}, added-at = {2009-11-05T12:01:24.000+0100}, author = {Bello, I. and Chan, C.Y. and Zhang, W.J. and Chong, Y.M. and Leung, K.M. and Lee, S.T. and Lifshitz, Y.}, biburl = {https://www.bibsonomy.org/bibtex/282a6bee8942ce0973e5ccce6d373c0c1/ghuot}, doi = {doi:10.1016/j.diamond.2004.12.041}, file = {bello2005b.pdf:C\:\\Documents and Settings\\Guillaume\\Bureau\\ACERDE\\Articles\\BN\\bello2005b.pdf:PDF}, interhash = {b9882694a878a690147a9bb2cd7ec765}, intrahash = {82a6bee8942ce0973e5ccce6d373c0c1}, journal = {Diamond and Related Materials}, keywords = {CVD Cubic Epitaxy; Physical Plasma boron deposition; enhanced nitride; vapor}, number = { 3-7}, owner = {Guillaume}, pages = {1154-1162}, timestamp = {2009-11-05T12:01:24.000+0100}, title = {Deposition of thick cubic boron nitride films: The route to practical applications}, volume = 14, year = 2005 }