%0 Book Section %1 statphys23_0394 %A Yasseri, T. %A Yewande, E.O. %A Kree, R. %A Hartmann, A.K. %B Abstract Book of the XXIII IUPAP International Conference on Statistical Physics %C Genova, Italy %D 2007 %E Pietronero, Luciano %E Loreto, Vittorio %E Zapperi, Stefano %K dot fromation ion montecarlo pattern quantum ripple simulation sputtering statphys23 topic-4 %T Monte Carlo Simulation of Ion Sputtered Surfaces %U http://st23.statphys23.org/webservices/abstract/preview_pop.php?ID_PAPER=394 %X It has been observed that keV ranged ion bombardment of a wide variety of materials in different conditions (angle of incidence, type of materials and ion beam's energy) may accrue to form different kind of patterns. Using Monte Carlo simulation methods, we studied the morphological behavior of ion sputtered surfaces mainly under the off-normal incidence angle. According to the different values of geometrical parameters of the model, we obtained various type of patterns such as quantum dots and ripple-likes structures which are in agreement with experiments. We were also able to analyze the large time scaling behavior and the influence of using different relaxation models. In recent work we tried to implement the ion divergence in the MC model observed in experiments and evaluate the effect on the time scales.

@incollection{statphys23_0394, abstract = {It has been observed that keV ranged ion bombardment of a wide variety of materials in different conditions (angle of incidence, type of materials and ion beam's energy) may accrue to form different kind of patterns. Using Monte Carlo simulation methods, we studied the morphological behavior of ion sputtered surfaces mainly under the off-normal incidence angle. According to the different values of geometrical parameters of the model, we obtained various type of patterns such as quantum dots and ripple-likes structures which are in agreement with experiments. We were also able to analyze the large time scaling behavior and the influence of using different relaxation models. In recent work we tried to implement the ion divergence in the MC model observed in experiments and evaluate the effect on the time scales.}, added-at = {2007-06-20T10:16:09.000+0200}, address = {Genova, Italy}, author = {Yasseri, T. and Yewande, E.O. and Kree, R. and Hartmann, A.K.}, biburl = {https://www.bibsonomy.org/bibtex/28530f528a5901f0fc8e5ca6d921a9656/statphys23}, booktitle = {Abstract Book of the XXIII IUPAP International Conference on Statistical Physics}, editor = {Pietronero, Luciano and Loreto, Vittorio and Zapperi, Stefano}, interhash = {e557ea3d5d3cff918bebc534a14d3da6}, intrahash = {8530f528a5901f0fc8e5ca6d921a9656}, keywords = {dot fromation ion montecarlo pattern quantum ripple simulation sputtering statphys23 topic-4}, month = {9-13 July}, timestamp = {2007-06-20T10:16:19.000+0200}, title = {Monte Carlo Simulation of Ion Sputtered Surfaces}, url = {http://st23.statphys23.org/webservices/abstract/preview_pop.php?ID_PAPER=394}, year = 2007 }