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Другие публикации лиц с тем же именем

Design-aware lithography., , и . ISPD, стр. 3-8. ACM, (2012)Timely Personalization at Peloton: A System and Algorithm for Boosting Time-Relevant Content., , , , , , и . RecSys, стр. 494-498. ACM, (2022)Design driven patterning optimizations for low K1 lithography., и . ICICDT, стр. 1-4. IEEE, (2012)ICCAD-2013 CAD contest in mask optimization and benchmark suite., , и . ICCAD, стр. 271-274. IEEE, (2013)Electrically driven optical proximity correction based on linear programming., , , и . ICCAD, стр. 473-479. IEEE Computer Society, (2008)A methodology for propagating design tolerances to shape tolerances for use in manufacturing., , , , и . DATE, стр. 1273-1278. IEEE Computer Society, (2010)Electrically-driven retargeting for nanoscale layouts., , и . CICC, стр. 1-4. IEEE, (2011)Fast lithographic mask optimization considering process variation., , , , и . ICCAD, стр. 230-237. IEEE, (2014)SMATO: Simultaneous mask and target optimization for improving lithographic process window., , и . ICCAD, стр. 100-106. IEEE, (2010)Personalizing Peloton: Combining Rankers and Filters To Balance Engagement and Business Goals., , , и . RecSys, стр. 575-576. ACM, (2021)