%0 Journal Article %1 Zhang2005 %A Zhang, W. J. %A Chan, C. Y. %A Meng, X. M. %A Fung, M. K. %A Bello, I. %A Lifshitz, Y. %A Lee, S. T. %A Jiang, X. %D 2005 %J Angewandte Chemie International Edition %K chemical chemistry crystal deposition growth mechanisms nitrides plasma reaction vapor %N 30 %P 4749--4753 %R 10.1002/anie.200500320 %T The Mechanism of Chemical Vapor Deposition of Cubic Boron Nitride Films from Fluorine-Containing Species %V 44

@article{Zhang2005, added-at = {2009-11-05T12:01:24.000+0100}, author = {Zhang, W. J. and Chan, C. Y. and Meng, X. M. and Fung, M. K. and Bello, I. and Lifshitz, Y. and Lee, S. T. and Jiang, X.}, biburl = {https://www.bibsonomy.org/bibtex/2140a301ace9ec0fd8516405830c22c00/ghuot}, doi = {10.1002/anie.200500320}, interhash = {00dd8b68869d58e05718903f9a4ae11f}, intrahash = {140a301ace9ec0fd8516405830c22c00}, journal = {Angewandte Chemie International Edition}, keywords = {chemical chemistry crystal deposition growth mechanisms nitrides plasma reaction vapor}, number = 30, owner = {Guillaume}, pages = {4749--4753}, timestamp = {2009-11-05T12:01:36.000+0100}, title = {The Mechanism of Chemical Vapor Deposition of Cubic Boron Nitride Films from Fluorine-Containing Species}, volume = 44, year = 2005 }