%0 Journal Article %1 journals/tci/MaWCLA19 %A Ma, Xu %A Wang, Zhiqiang %A Chen, Xuanbo %A Li, Yanqiu %A Arce, Gonzalo R. %D 2019 %J IEEE Trans. Computational Imaging %K dblp %N 1 %P 120-135 %T Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography. %U http://dblp.uni-trier.de/db/journals/tci/tci5.html#MaWCLA19 %V 5

@article{journals/tci/MaWCLA19, added-at = {2019-02-27T00:00:00.000+0100}, author = {Ma, Xu and Wang, Zhiqiang and Chen, Xuanbo and Li, Yanqiu and Arce, Gonzalo R.}, biburl = {https://www.bibsonomy.org/bibtex/2abf4fedbfbf9b35f412fb2e2c51ccebc/dblp}, ee = {https://doi.org/10.1109/TCI.2018.2880342}, interhash = {7188f862279728e84fa01e6e089bbc6c}, intrahash = {abf4fedbfbf9b35f412fb2e2c51ccebc}, journal = {IEEE Trans. Computational Imaging}, keywords = {dblp}, number = 1, pages = {120-135}, timestamp = {2019-02-28T11:39:20.000+0100}, title = {Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography.}, url = {http://dblp.uni-trier.de/db/journals/tci/tci5.html#MaWCLA19}, volume = 5, year = 2019 }