%0 Journal Article %1 journals/mr/PoliakovBPMGVHD12 %A Poliakov, Pavel %A Blomme, Pieter %A Pret, Alessandro Vaglio %A Miranda, Miguel Corbalan %A Gronheid, Roel %A Verkest, Diederik %A Houdt, Jan Van %A Dehaene, Wim %D 2012 %J Microelectron. Reliab. %K dblp %N 3 %P 525-529 %T Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories. %U http://dblp.uni-trier.de/db/journals/mr/mr52.html#PoliakovBPMGVHD12 %V 52

@article{journals/mr/PoliakovBPMGVHD12, added-at = {2020-02-22T00:00:00.000+0100}, author = {Poliakov, Pavel and Blomme, Pieter and Pret, Alessandro Vaglio and Miranda, Miguel Corbalan and Gronheid, Roel and Verkest, Diederik and Houdt, Jan Van and Dehaene, Wim}, biburl = {https://www.bibsonomy.org/bibtex/271986b24144d30e6d614e533a97ae29b/dblp}, ee = {https://doi.org/10.1016/j.microrel.2011.09.037}, interhash = {8e8ba9458043155553750891692f2ab0}, intrahash = {71986b24144d30e6d614e533a97ae29b}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = 3, pages = {525-529}, timestamp = {2020-02-25T13:23:32.000+0100}, title = {Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr52.html#PoliakovBPMGVHD12}, volume = 52, year = 2012 }