Inproceedings,
28nm metal-gate high-K CMOS SoC technology for high-performance mobile applications.
S. Yang, J. Sheu, M. Ieong, M. Chiang, T. Yamamoto, J. Liaw, S. Chang, Y. Lin, T. Hsu, J. Hwang, J. Ting, C. Wu, K. Ting, F. Yang, C. Liu, I. Wu, Y. Chen, S. Chent, K. Chen, J. Cheng, M. Tsai, W. Chang, R. Chen, C. Chen, T. Lee, C. Lin, S. Yang, Y. Sheu, J. Tzeng, L. Lu, S. Jang, C. Diaz, and Y. Mii.CICC, page 1-5. IEEE, (2011)
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- CICC
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- 2011
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- 1-5
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- https://doi.org/10.1109/CICC.2011.6055355
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- 978-1-4577-0222-8
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- http://dblp.uni-trier.de/db/conf/cicc/cicc2011.html#YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11
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%1 conf/cicc/YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11
%A Yang, S. H.
%A Sheu, J. Y.
%A Ieong, M. K.
%A Chiang, M. H.
%A Yamamoto, T.
%A Liaw, J. J.
%A Chang, S. S.
%A Lin, Y. M.
%A Hsu, T. L.
%A Hwang, J. R.
%A Ting, J. K.
%A Wu, C. H.
%A Ting, K. C.
%A Yang, F. C.
%A Liu, C. M.
%A Wu, I. L.
%A Chen, Y. M.
%A Chent, S. J.
%A Chen, K. S.
%A Cheng, J. Y.
%A Tsai, M. H.
%A Chang, W.
%A Chen, R.
%A Chen, C. C.
%A Lee, T. L.
%A Lin, C. K.
%A Yang, S. C.
%A Sheu, Y. M.
%A Tzeng, J. T.
%A Lu, L. C.
%A Jang, S. M.
%A Diaz, Carlos H.
%A Mii, Yuh-Jier
%B CICC
%D 2011
%E Patel, Rakesh
%E Andre, Tom
%E Khan, Aurangzeb
%I IEEE
%K dblp
%P 1-5
%T 28nm metal-gate high-K CMOS SoC technology for high-performance mobile applications.
%U http://dblp.uni-trier.de/db/conf/cicc/cicc2011.html#YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11
%@ 978-1-4577-0222-8
@inproceedings{conf/cicc/YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11,
added-at = {2023-10-06T00:00:00.000+0200},
author = {Yang, S. H. and Sheu, J. Y. and Ieong, M. K. and Chiang, M. H. and Yamamoto, T. and Liaw, J. J. and Chang, S. S. and Lin, Y. M. and Hsu, T. L. and Hwang, J. R. and Ting, J. K. and Wu, C. H. and Ting, K. C. and Yang, F. C. and Liu, C. M. and Wu, I. L. and Chen, Y. M. and Chent, S. J. and Chen, K. S. and Cheng, J. Y. and Tsai, M. H. and Chang, W. and Chen, R. and Chen, C. C. and Lee, T. L. and Lin, C. K. and Yang, S. C. and Sheu, Y. M. and Tzeng, J. T. and Lu, L. C. and Jang, S. M. and Diaz, Carlos H. and Mii, Yuh-Jier},
biburl = {https://www.bibsonomy.org/bibtex/2c28c53c65ff6a7000206dee6845fa6f9/dblp},
booktitle = {CICC},
crossref = {conf/cicc/2011},
editor = {Patel, Rakesh and Andre, Tom and Khan, Aurangzeb},
ee = {https://doi.org/10.1109/CICC.2011.6055355},
interhash = {9d5af1b1111096cf0cf3de1ed1f77290},
intrahash = {c28c53c65ff6a7000206dee6845fa6f9},
isbn = {978-1-4577-0222-8},
keywords = {dblp},
pages = {1-5},
publisher = {IEEE},
timestamp = {2024-04-10T22:11:01.000+0200},
title = {28nm metal-gate high-K CMOS SoC technology for high-performance mobile applications.},
url = {http://dblp.uni-trier.de/db/conf/cicc/cicc2011.html#YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11},
year = 2011
}