%0 Conference Paper %1 conf/idt/SalemEEDA10 %A Salem, Rami F. %A ElMously, Abdelrahman %A Eissa, Haitham %A Dessouky, Mohamed %A Anis, Mohab H. %B IDT %D 2010 %E Zorian, Yervant %E Elahi, Imtinan %E Ivanov, André %E Salem, Ashraf %I IEEE %K dblp %P 13-17 %T A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs. %U http://dblp.uni-trier.de/db/conf/idt/idt2010.html#SalemEEDA10 %@ 978-1-61284-291-2

@inproceedings{conf/idt/SalemEEDA10, added-at = {2017-05-24T00:00:00.000+0200}, author = {Salem, Rami F. and ElMously, Abdelrahman and Eissa, Haitham and Dessouky, Mohamed and Anis, Mohab H.}, biburl = {https://www.bibsonomy.org/bibtex/281af608ea59a420133bfc54a27b6d6a7/dblp}, booktitle = {IDT}, crossref = {conf/idt/2010}, editor = {Zorian, Yervant and Elahi, Imtinan and Ivanov, André and Salem, Ashraf}, ee = {https://doi.org/10.1109/IDT.2010.5724398}, interhash = {9f323f8b928c8a97bdbc87813784d959}, intrahash = {81af608ea59a420133bfc54a27b6d6a7}, isbn = {978-1-61284-291-2}, keywords = {dblp}, pages = {13-17}, publisher = {IEEE}, timestamp = {2019-10-17T13:34:46.000+0200}, title = {A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs.}, url = {http://dblp.uni-trier.de/db/conf/idt/idt2010.html#SalemEEDA10}, year = 2010 }