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%0 Conference Paper
%1 conf/idt/SalemEEDA10
%A Salem, Rami F.
%A ElMously, Abdelrahman
%A Eissa, Haitham
%A Dessouky, Mohamed
%A Anis, Mohab H.
%B IDT
%D 2010
%E Zorian, Yervant
%E Elahi, Imtinan
%E Ivanov, André
%E Salem, Ashraf
%I IEEE
%K dblp
%P 13-17
%T A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs.
%U http://dblp.uni-trier.de/db/conf/idt/idt2010.html#SalemEEDA10
%@ 978-1-61284-291-2
@inproceedings{conf/idt/SalemEEDA10,
added-at = {2017-05-24T00:00:00.000+0200},
author = {Salem, Rami F. and ElMously, Abdelrahman and Eissa, Haitham and Dessouky, Mohamed and Anis, Mohab H.},
biburl = {https://www.bibsonomy.org/bibtex/281af608ea59a420133bfc54a27b6d6a7/dblp},
booktitle = {IDT},
crossref = {conf/idt/2010},
editor = {Zorian, Yervant and Elahi, Imtinan and Ivanov, André and Salem, Ashraf},
ee = {https://doi.org/10.1109/IDT.2010.5724398},
interhash = {9f323f8b928c8a97bdbc87813784d959},
intrahash = {81af608ea59a420133bfc54a27b6d6a7},
isbn = {978-1-61284-291-2},
keywords = {dblp},
pages = {13-17},
publisher = {IEEE},
timestamp = {2019-10-17T13:34:46.000+0200},
title = {A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs.},
url = {http://dblp.uni-trier.de/db/conf/idt/idt2010.html#SalemEEDA10},
year = 2010
}