%0 Journal Article %1 journals/mr/ChenBHSA08 %A Chen, Fen %A Bravo, O. %A Harmon, Dave %A Shinosky, Michael A. %A Aitken, J. %D 2008 %J Microelectron. Reliab. %K dblp %N 8-9 %P 1375-1383 %T Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies. %U http://dblp.uni-trier.de/db/journals/mr/mr48.html#ChenBHSA08 %V 48

@article{journals/mr/ChenBHSA08, added-at = {2020-02-22T00:00:00.000+0100}, author = {Chen, Fen and Bravo, O. and Harmon, Dave and Shinosky, Michael A. and Aitken, J.}, biburl = {https://www.bibsonomy.org/bibtex/2c87d7eeef4eb58cb3924cbb4ce24ad53/dblp}, ee = {https://doi.org/10.1016/j.microrel.2008.06.037}, interhash = {aec5324c13607fd1c84f1c8b3fa96427}, intrahash = {c87d7eeef4eb58cb3924cbb4ce24ad53}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = {8-9}, pages = {1375-1383}, timestamp = {2020-02-25T13:29:40.000+0100}, title = {Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr48.html#ChenBHSA08}, volume = 48, year = 2008 }