%0 Journal Article %1 journals/mr/LeyrisMHVV07 %A Leyris, Cédric %A Martinez, Frédéric %A Hoffmann, Alain %A Valenza, M. %A Vildeuil, J. C. %D 2007 %J Microelectron. Reliab. %K dblp %N 1 %P 41-45 %T N-MOSFET oxide trap characterization induced by nitridation process using RTS noise analysis. %U http://dblp.uni-trier.de/db/journals/mr/mr47.html#LeyrisMHVV07 %V 47

@article{journals/mr/LeyrisMHVV07, added-at = {2020-11-03T00:00:00.000+0100}, author = {Leyris, Cédric and Martinez, Frédéric and Hoffmann, Alain and Valenza, M. and Vildeuil, J. C.}, biburl = {https://www.bibsonomy.org/bibtex/27c3f551e5515605c108b24c4d1dae102/dblp}, ee = {https://doi.org/10.1016/j.microrel.2006.02.010}, interhash = {b41f8a709dcc863b460f89f5d49e51cc}, intrahash = {7c3f551e5515605c108b24c4d1dae102}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = 1, pages = {41-45}, timestamp = {2020-11-04T11:35:48.000+0100}, title = {N-MOSFET oxide trap characterization induced by nitridation process using RTS noise analysis.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr47.html#LeyrisMHVV07}, volume = 47, year = 2007 }