Inproceedings,
Robust PEALD SiN spacer for gate first high-k metal gate integration.
D. Triyoso, V. Jaschke, J. Shu, S. Mutas, K. Hempel, J. Schaeffer, and M. Lenski.ICICDT, page 1-4. IEEE, (2012)
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- conf/icicdt/TriyosoJSMHSL12
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- ICICDT
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- 2012
- pages
- 1-4
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- IEEE
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- ee
- https://doi.org/10.1109/ICICDT.2012.6232870
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- 978-1-4673-0146-6
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- http://dblp.uni-trier.de/db/conf/icicdt/icicdt2012.html#TriyosoJSMHSL12
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%1 conf/icicdt/TriyosoJSMHSL12
%A Triyoso, D. H.
%A Jaschke, V.
%A Shu, Jeff
%A Mutas, S.
%A Hempel, Klaus
%A Schaeffer, Jamie K.
%A Lenski, Markus
%B ICICDT
%D 2012
%I IEEE
%K dblp
%P 1-4
%T Robust PEALD SiN spacer for gate first high-k metal gate integration.
%U http://dblp.uni-trier.de/db/conf/icicdt/icicdt2012.html#TriyosoJSMHSL12
%@ 978-1-4673-0146-6
@inproceedings{conf/icicdt/TriyosoJSMHSL12,
added-at = {2023-09-30T00:00:00.000+0200},
author = {Triyoso, D. H. and Jaschke, V. and Shu, Jeff and Mutas, S. and Hempel, Klaus and Schaeffer, Jamie K. and Lenski, Markus},
biburl = {https://www.bibsonomy.org/bibtex/292942b1bc80437cb9d41134527a5c018/dblp},
booktitle = {ICICDT},
crossref = {conf/icicdt/2012},
ee = {https://doi.org/10.1109/ICICDT.2012.6232870},
interhash = {ff69b7335768b01876c4cc86634064bf},
intrahash = {92942b1bc80437cb9d41134527a5c018},
isbn = {978-1-4673-0146-6},
keywords = {dblp},
pages = {1-4},
publisher = {IEEE},
timestamp = {2024-04-10T21:05:54.000+0200},
title = {Robust PEALD SiN spacer for gate first high-k metal gate integration.},
url = {http://dblp.uni-trier.de/db/conf/icicdt/icicdt2012.html#TriyosoJSMHSL12},
year = 2012
}