%0 Conference Paper %1 conf/iccad/TianYTW02 %A Tian, Ruiqi %A Yu, Ronggang %A Tang, Xiaoping %A Wong, D. F. %B ICCAD %D 2002 %E Pileggi, Lawrence T. %E Kuehlmann, Andreas %I ACM / IEEE Computer Society %K dblp %P 514-518 %T On mask layout partitioning for electron projection lithography. %U http://dblp.uni-trier.de/db/conf/iccad/iccad2002.html#TianYTW02 %@ 0-7803-7607-2

@inproceedings{conf/iccad/TianYTW02, added-at = {2023-03-24T00:00:00.000+0100}, author = {Tian, Ruiqi and Yu, Ronggang and Tang, Xiaoping and Wong, D. F.}, biburl = {https://www.bibsonomy.org/bibtex/22f40851d13efa5cd992e4048170aef8d/dblp}, booktitle = {ICCAD}, crossref = {conf/iccad/2002}, editor = {Pileggi, Lawrence T. and Kuehlmann, Andreas}, ee = {https://doi.ieeecomputersociety.org/10.1109/ICCAD.2002.1167581}, interhash = {224085a85e34dfc375faac71dd6c7d2f}, intrahash = {2f40851d13efa5cd992e4048170aef8d}, isbn = {0-7803-7607-2}, keywords = {dblp}, pages = {514-518}, publisher = {ACM / IEEE Computer Society}, timestamp = {2024-04-10T17:53:35.000+0200}, title = {On mask layout partitioning for electron projection lithography.}, url = {http://dblp.uni-trier.de/db/conf/iccad/iccad2002.html#TianYTW02}, year = 2002 }