A fitting model is developed for accounting the asymmetric ambipolarities in
the I-V characteristics of graphene field-effect transistors (G-FETs) with
doped channels, originating from the thermionic emission and interband
tunneling at the junctions between the gated and access regions. Using the
model, the gate-voltage-dependent intrinsic mobility as well as other intrinsic
and extrinsic device parameters can be extracted. We apply it to a top-gated
G-FET with a graphene channel grown on a SiC substrate and with SiN gate
dielectric that we reported previously, and we demonstrate that it can
excellently fit its asymmetric I-V characteristic.
Description
A Fitting Model for Asymmetric I-V Characteristics of Graphene Field-Effect Transistors for Extraction of Intrinsic Mobilities
%0 Generic
%1 satou2016fitting
%A Satou, Akira
%A Tamamushi, Gen
%A Sugawara, Kenta
%A Mitsushio, Junki
%A Ryzhii, Victor
%A Otsuji, Taiichi
%D 2016
%K graphene
%R 10.1109/TED.2016.2578325
%T A Fitting Model for Asymmetric I-V Characteristics of Graphene
Field-Effect Transistors for Extraction of Intrinsic Mobilities
%U http://arxiv.org/abs/1603.00099
%X A fitting model is developed for accounting the asymmetric ambipolarities in
the I-V characteristics of graphene field-effect transistors (G-FETs) with
doped channels, originating from the thermionic emission and interband
tunneling at the junctions between the gated and access regions. Using the
model, the gate-voltage-dependent intrinsic mobility as well as other intrinsic
and extrinsic device parameters can be extracted. We apply it to a top-gated
G-FET with a graphene channel grown on a SiC substrate and with SiN gate
dielectric that we reported previously, and we demonstrate that it can
excellently fit its asymmetric I-V characteristic.
@misc{satou2016fitting,
abstract = {A fitting model is developed for accounting the asymmetric ambipolarities in
the I-V characteristics of graphene field-effect transistors (G-FETs) with
doped channels, originating from the thermionic emission and interband
tunneling at the junctions between the gated and access regions. Using the
model, the gate-voltage-dependent intrinsic mobility as well as other intrinsic
and extrinsic device parameters can be extracted. We apply it to a top-gated
G-FET with a graphene channel grown on a SiC substrate and with SiN gate
dielectric that we reported previously, and we demonstrate that it can
excellently fit its asymmetric I-V characteristic.},
added-at = {2021-03-13T21:21:23.000+0100},
author = {Satou, Akira and Tamamushi, Gen and Sugawara, Kenta and Mitsushio, Junki and Ryzhii, Victor and Otsuji, Taiichi},
biburl = {https://www.bibsonomy.org/bibtex/22f1b098831279ad6a584d8c74e3c3ab2/cmcneile},
description = {A Fitting Model for Asymmetric I-V Characteristics of Graphene Field-Effect Transistors for Extraction of Intrinsic Mobilities},
doi = {10.1109/TED.2016.2578325},
interhash = {6979d59d3d3d8f931612604052c46e95},
intrahash = {2f1b098831279ad6a584d8c74e3c3ab2},
keywords = {graphene},
note = {cite arxiv:1603.00099Comment: 8 pages, 6 figures},
timestamp = {2021-03-13T21:21:23.000+0100},
title = {A Fitting Model for Asymmetric I-V Characteristics of Graphene
Field-Effect Transistors for Extraction of Intrinsic Mobilities},
url = {http://arxiv.org/abs/1603.00099},
year = 2016
}