The temperature dependencies of the change in Gibbs energy for a series
of probable reactions of chemical vapor deposition (CVD) of TiB2,
ZrB2, NbB2, TaB2, and LaB6 using BCl3, BBr3, B2H6, B5H9, and B10H14
as boron sources have been plotted on the basis of thermodynamic
data from the literature. It has been shown that from a thermodynamic
point of view the deposition of these borides should proceed in all
cases under milder conditions when boron hydrides are the boron sources.
Is has been established that of the two boron halides BBr3 is the
more suitable boron precursor in the CVD of the borides under consideration.
Due to its properties this boron halide would probably prove especially
appropriate for technological processes of transition metal diboride
deposition.
%0 Journal Article
%1 Peshev2000
%A Peshev, P.
%D 2000
%J Journal of Solid State Chemistry
%K borides; boron chemical deposition; estimation; halides; hydrides. thermodynamic vapor
%N 1
%P 157--161
%R doi:10.1006/jssc.2000.8828
%T A Thermodynamic Estimation of the Chemical Vapor Deposition of Some
Borides
%V 154
%X The temperature dependencies of the change in Gibbs energy for a series
of probable reactions of chemical vapor deposition (CVD) of TiB2,
ZrB2, NbB2, TaB2, and LaB6 using BCl3, BBr3, B2H6, B5H9, and B10H14
as boron sources have been plotted on the basis of thermodynamic
data from the literature. It has been shown that from a thermodynamic
point of view the deposition of these borides should proceed in all
cases under milder conditions when boron hydrides are the boron sources.
Is has been established that of the two boron halides BBr3 is the
more suitable boron precursor in the CVD of the borides under consideration.
Due to its properties this boron halide would probably prove especially
appropriate for technological processes of transition metal diboride
deposition.
@article{Peshev2000,
abstract = {The temperature dependencies of the change in Gibbs energy for a series
of probable reactions of chemical vapor deposition (CVD) of TiB2,
ZrB2, NbB2, TaB2, and LaB6 using BCl3, BBr3, B2H6, B5H9, and B10H14
as boron sources have been plotted on the basis of thermodynamic
data from the literature. It has been shown that from a thermodynamic
point of view the deposition of these borides should proceed in all
cases under milder conditions when boron hydrides are the boron sources.
Is has been established that of the two boron halides BBr3 is the
more suitable boron precursor in the CVD of the borides under consideration.
Due to its properties this boron halide would probably prove especially
appropriate for technological processes of transition metal diboride
deposition.},
added-at = {2009-11-05T12:01:24.000+0100},
author = {Peshev, P.},
biburl = {https://www.bibsonomy.org/bibtex/2642ed05d25b89bb80d571352b8574d6a/ghuot},
doi = {doi:10.1006/jssc.2000.8828},
institution = {Institute of General and Inorganic Chemistry, Bulgarian Academy of
Sciences, Acad. G. Bonchev str., bldg.11, 1113, Sofia, Bulgaria},
interhash = {6a4bc7837f8fb339661db095f92b1f9c},
intrahash = {642ed05d25b89bb80d571352b8574d6a},
journal = {Journal of Solid State Chemistry},
keywords = {borides; boron chemical deposition; estimation; halides; hydrides. thermodynamic vapor},
number = 1,
owner = {Guillaume},
pages = {157--161},
timestamp = {2009-11-05T12:01:33.000+0100},
title = {A Thermodynamic Estimation of the Chemical Vapor Deposition of Some
Borides},
volume = { 154},
year = 2000
}