Article,

Polyvinyl alcohol templates for low cost, high resolution, complex printing

, and .
Journal of Vacuum Science & Technology B, 22 (6): 3323--3326 (2004)
DOI: http://dx.doi.org/10.1116/1.1827218

Abstract

Templates for imprint lithography and MxL (molecular transfer lithography) are generated by adhesion of a spin-cast film of polyvinyl alcohol (PVA) to a carrier comprised of materials selected for conformability or distortion reduction. Template formation using both polymeric carrier materials and rigid materials, including quartz and glass carrier materials, is demonstrated. The absence of a carrier material altogether to form a suspended thin film is shown to be feasible. The rigid template material is formed by bonding the PVA patternedfilm to a rigid carrier while still connected to the master pattern, and it is demonstrated that separation occurs at the PVA-silicon master pattern interface. Form factors for the templates include a 25 mm × 25 mm patternedfilm attached to a 65 mm × 65 mm glass substrate, a full 100 mm pattern bonded to a quartz substrate, and a 100 mm mask of Mylar™ bonded with a patterned PVA film for MxL applications. These carrier materials are developed in a form factor compatible with commercial nanoimprint lithography tools, and for standard contact aligners adapted to perform MxL processing.

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