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%0 Conference Paper
%1 conf/icip/CookL95
%A Cook, B. D.
%A Lee, Soo-Young
%B ICIP
%D 1995
%I IEEE Computer Society
%K dblp
%P 442-445
%T Fast exposure simulation for large circuit patterns in electron beam lithography.
%U http://dblp.uni-trier.de/db/conf/icip/icip1995-1.html#CookL95
%@ 0-8186-7310-9
@inproceedings{conf/icip/CookL95,
added-at = {2023-03-24T00:00:00.000+0100},
author = {Cook, B. D. and Lee, Soo-Young},
biburl = {https://www.bibsonomy.org/bibtex/24d8209b22de1bc13b3bba11b0b866b84/dblp},
booktitle = {ICIP},
crossref = {conf/icip/1995},
ee = {https://doi.ieeecomputersociety.org/10.1109/ICIP.1995.529741},
interhash = {49fc7e2175c9465cc91da3ee8a5997b9},
intrahash = {4d8209b22de1bc13b3bba11b0b866b84},
isbn = {0-8186-7310-9},
keywords = {dblp},
pages = {442-445},
publisher = {IEEE Computer Society},
timestamp = {2024-04-09T09:40:57.000+0200},
title = {Fast exposure simulation for large circuit patterns in electron beam lithography.},
url = {http://dblp.uni-trier.de/db/conf/icip/icip1995-1.html#CookL95},
year = 1995
}