%0 Journal Article %1 journals/mr/AmatRNAS07 %A Amat, Esteve %A Rodríguez, Rosana %A Nafría, Montserrat %A Aymerich, Xavier %A Stathis, James H. %D 2007 %J Microelectron. Reliab. %K dblp %N 4-5 %P 544-547 %T Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions. %U http://dblp.uni-trier.de/db/journals/mr/mr47.html#AmatRNAS07 %V 47

@article{journals/mr/AmatRNAS07, added-at = {2020-02-22T00:00:00.000+0100}, author = {Amat, Esteve and Rodríguez, Rosana and Nafría, Montserrat and Aymerich, Xavier and Stathis, James H.}, biburl = {https://www.bibsonomy.org/bibtex/2552e6d045ccf9fe07a81b8c2afcf3cd4/dblp}, ee = {https://doi.org/10.1016/j.microrel.2007.01.003}, interhash = {56dec24d09d994bf2c47e35234baba07}, intrahash = {552e6d045ccf9fe07a81b8c2afcf3cd4}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = {4-5}, pages = {544-547}, timestamp = {2020-02-25T13:28:32.000+0100}, title = {Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr47.html#AmatRNAS07}, volume = 47, year = 2007 }