Abstract
We report Raman scattering and low temperature photoluminescence
measurements performed on a series of Molecular-Beam-Epitaxy-grown
Si/Ge-n/Si quantum wells with n varying from 3 to 6. Our results are
consistent with a gradual evolution of the Si/Ge interface which starts
with Ge segregation and formation of terraces for low Ge coverage, to
smooth 2-dimensional Ge layers, bounded by interfacial alloy layers, for
coverages superior to 4-monolayers. (C) 1998 Elsevier Science Ltd. All
rights reserved.
Users
Please
log in to take part in the discussion (add own reviews or comments).